SEMI T2 : 1998(R2004)
Withdrawn
A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.
SPECIFICATION FOR MARKING OF WAFERS WITH A TWO-DIMENSIONAL MATRIX CODE SYMBOL
11-01-2010
01-12-2013
Intended to provide a marking symbology that can be used to mark silicon wafers with minimum intrusion into the fixed area of the wafer. Defines the spatial and geometric relationships and content (including the error checking and correcting code) of a two-dimensional (2-D), machine-readable, binary matrix code symbol for front surface marking of wafers of silicon which conform to SEMI M1, SEMI M2, or SEMI M11, and other materials with diameters of 125 to 200 mm. Allows for consistency of all wafer marking performed by wafer manufacturers. It may be used in conjunction with, or as an alternative to, the alphanumeric marking codes specified in SEMI M12 and SEMI M13 or a front surface bar code like that specified in SEMI T1.
DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. E = Editorially modified to correct an error. (05/2001)
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DocumentType |
Standard
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PublisherName |
Semiconductor Equipment & Materials Institute
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Status |
Withdrawn
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NASA STD 6002 : 2008 | APPLYING DATA MATRIX IDENTIFICATION SYMBOLS ON AEROSPACE PARTS |
NASA HDBK 6003 : 2008 | APPLICATION OF DATA MATRIX IDENTIFICATION SYMBOLS TO AEROSPACE PARTS USING DIRECT PART MARKING METHODS/TECHNIQUES |
SEMI T1 : 1995(R2003) | SPECIFICATION FOR BACK SURFACE BAR CODE MARKING OF SILICON WAFERS |
SEMI M2 : 2003 | SPECIFICATION FOR SILICON EPITAXIAL WAFERS FOR DISCRETE DEVICE APPLICATIONS |
SEMI M11 : 2004 | SPECIFICATIONS FOR SILICON EPITAXIAL WAFERS FOR INTEGRATED CIRCUIT (IC) APPLICATIONS |
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