EN 62374-1:2010
Current
Current
The latest, up-to-date edition.
Semiconductor devices - Part 1: Time-dependent dielectric breakdown (TDDB) test for inter-metal layers
Amended by
Published date
11-19-2010
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IEC 62374-1:2010 describes a test method, test structure and lifetime estimation method of the time-dependent dielectric breakdown (TDDB) test for inter-metal layers applied in semiconductor devices.
| Committee |
CLC/TC 47X
|
| DocumentType |
Standard
|
| PublisherName |
European Committee for Standards - Electrical
|
| Status |
Current
|
| Standards | Relationship |
| I.S. EN 62374-1:2010 | Equivalent |
| BS EN 62374-1:2010 | Equivalent |
| UNE-EN 62374-1:2010 | Identical |
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