
NEN EN IEC 62047-2 : 2006
Current
Current
The latest, up-to-date edition.

SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 2: TENSILE TESTING METHOD OF THIN FILM MATERIALS
Published date
12-01-2013
Publisher
Defines the method for tensile testing of thin film materials with length and width under 1 mm and thickness under 10 m, which are main structural materials for micro-electromechanical systems (MEMS), micromachines and similar devices.
DocumentType |
Standard
|
PublisherName |
Netherlands Standards
|
Status |
Current
|
Standards | Relationship |
EN 62047-2:2006 | Identical |
IEC 62047-2:2006 | Identical |
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