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IEC 62047-26:2016

Current

Current

The latest, up-to-date edition.

Semiconductor devices - Micro-electromechanical devices - Part 26: Description and measurement methods for micro trench and needle structures

Available format(s)

Hardcopy , PDF , PDF 3 Users , PDF 5 Users , PDF 9 Users

Language(s)

English - French

Published date

07-01-2016

FOREWORD
1 Scope
2 Normative references
3 Terms and definitions
4 Description of trench structures in a micrometer
  scale
5 Description of needle structures in a micrometer
  scale
6 Measurement method
Annex A (informative) - Examples of measurement for
        trench and needle structures in a micrometer
        scale
Annex B (informative) - Uncertainty in dimensional
        measurement
Bibliography

IEC 62047-26:2016 specifies descriptions of trench structure and needle structure in a micrometer scale. In addition, it provides examples of measurement for the geometry of both structures. For trench structures, this standard applies to structures with a depth of 1 µm to 100 µm; walls and trenches with respective widths of 5 µm to 150 µm; and aspect ratio of 0,006 7 to 20. For needle structures, the standard applies to structures with three or four faces with a height, horizontal width and vertical width of 2 µm or larger, and with dimensions that fit inside a cube with sides of 100 µm. This standard is applicable to the structural design of MEMS and geometrical evaluation after MEMS processes.

Committee
TC 47/SC 47F
DevelopmentNote
Stability date: 2020. (01/2016)
DocumentType
Standard
Pages
57
PublisherName
International Electrotechnical Committee
Status
Current

ISO 3274:1996 Geometrical Product Specifications (GPS) — Surface texture: Profile method — Nominal characteristics of contact (stylus) instruments
ISO 129-1:2004 Technical drawings Indication of dimensions and tolerances Part 1: General principles
ISO/IEC Guide 98-3:2008 Uncertainty of measurement — Part 3: Guide to the expression of uncertainty in measurement (GUM:1995)

£177.93
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