Customer Support: 131 242

  • Shopping Cart
    There are no items in your cart
We noticed you’re not on the correct regional site. Switch to our AMERICAS site for the best experience.
Dismiss alert

EN 62047-1:2016

Current

Current

The latest, up-to-date edition.

Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions

Published date

08-04-2016

FOREWORD
1 Scope
2 Terms and definitions
Annex A (informative) - Standpoint and criteria in editing
        this glossary
Annex B (informative) - Clause cross-references of
        IEC 62047-1:2005 and IEC 62047-1:2015
Bibliography

IEC 62047-1:2016 defines terms for micro-electromechanical devices including the process of production of such devices.This edition includes the following significant technical changes with respect to the previous edition:a) removal of ten terms;b) revision of twelve terms;c) addition of sixteen new terms.

Committee
CLC/TC 47X
DocumentType
Standard
PublisherName
European Committee for Standards - Electrical
Status
Current

BS EN 62047-25:2016 Semiconductor devices. Micro-electromechanical devices Silicon based MEMS fabrication technology. Measurement method of pull-press and shearing strength of micro bonding area
I.S. EN 62047-4:2010 SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 4: GENERIC SPECIFICATION FOR MEMS
CEI EN 60876-1 : 2015 FIBRE OPTIC INTERCONNECTING DEVICES AND PASSIVE COMPONENTS - FIBRE OPTIC SPATIAL SWITCHES - PART 1: GENERIC SPECIFICATION
I.S. EN 62047-14:2012 SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 14: FORMING LIMIT MEASURING METHOD OF METALLIC FILM MATERIALS (IEC 62047-14:2012 (EQV))
BS EN 60876-1:2014 Fibre optic interconnecting devices and passive components. Fibre optic spatial switches Generic specification
BS EN 62047-14:2012 Semiconductor devices. Micro-electromechanical devices Forming limit measuring method of metallic film materials
I.S. EN 62047-25:2016 SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 25: SILICON BASED MEMS FABRICATION TECHNOLOGY - MEASUREMENT METHOD OF PULL-PRESS AND SHEARING STRENGTH OF MICRO BONDING AREA
CEI EN 62047-14 : 2013 SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 14: FORMING LIMIT MEASURING METHOD OF METALLIC FILM MATERIALS
BS EN 62047-4:2010 Semiconductor devices. Micro-electromechanical devices Generic specification for MEMS
EN 62047-14:2012 Semiconductor devices - Micro-electromechanical devices - Part 14: Forming limit measuring method of metallic film materials
EN 62047-4:2010 Semiconductor devices - Micro-electromechanical devices - Part 4: Generic specification for MEMS
CEI EN 62047-4 : 2011 SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 4: GENERIC SPECIFICATION FOR MEMS
CEI EN 62047-25 : 1ED 2017 SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 25: SILICON BASED MEMS FABRICATION TECHNOLOGY - MEASUREMENT METHOD OF PULL-PRESS AND SHEARING STRENGTH OF MICRO BONDING AREA
I.S. EN 60876-1:2014 FIBRE OPTIC INTERCONNECTING DEVICES AND PASSIVE COMPONENTS - FIBRE OPTIC SPATIAL SWITCHES - PART 1: GENERIC SPECIFICATION
EN 60876-1:2014 Fibre optic interconnecting devices and passive components - Fibre optic spatial switches - Part 1: Generic specification

IEC 60050-815:2015 International Electrotechnical Vocabulary (IEV) - Part 815: Superconductivity
ISO 2041:2009 Mechanical vibration, shock and condition monitoring Vocabulary
IEC 60050-521:2002 International Electrotechnical Vocabulary (IEV) - Part 521: Semiconductor devices and integrated circuits

Sorry this product is not available in your region.

Access your standards online with a subscription

Features

  • Simple online access to standards, technical information and regulations.

  • Critical updates of standards and customisable alerts and notifications.

  • Multi-user online standards collection: secure, flexible and cost effective.